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Foundry Design Kit


MM/RF Foundry Design Kit (FDK)

The FDK (Foundry Design Kit) provides IC designers with an automatic design environment that eliminates unnecessary manual tasks and ensures successful tape-out.
The MM/RF complete design flow for UMC's various processes covers both the front and back-end of RFIC development. The methodology provides access to circuit-level design and simulation, circuit layout, and layout verification together with accurate RF device models. In the front-end, fundamental components of UMC's MM/RF process are implemented in common design environments and simulation tools. The back-end includes parameterized cells (PCell), which includes a schematic driven layout to provide an automatic and complete design flow. Callback functions are also provided in the design flow to minimize data entry. Through the procedure, designers can increase their productivity and reduce the risk for errors.

UMC has also worked with its EDA tool partners to deliver the industry's first parameterized spiral inductor design kit based on full-wave simulation - the Virtual Inductor Library (VIL). The VIL enables RFCMOS designers to create and simulate custom inductor geometries that are compatible with UMC's processes. It is built upon UMC's Electromagnetic Design Methodology (EMDM), which allows engineers to easily and accurately create any RF structure. EMDM gives designers the flexibility to innovate new geometries simply by editing parameters such as diameter, number of turns, width and spacing of traces.

In addition, UMC offers the Optimum Inductor Finder (OIF) in the FDK package. The OIF gives designers the ability to quickly access a large library of inductors accurately calibrated to UMC's silicon. It also allows users to perform inductor optimization through just a few simple steps using the user-friendly software. For instance, customers can define a desired inductance and make tradeoffs between Q-factor and area. The OIF will select from its inductor library a design that best fits the specifications in a matter of seconds.

The tools for MM/RF designs are also supported. Please refer to the summary list in "Reference Design Flow" in MyUMC for the details. For further information regarding the FDK, please contact your Account Manager.

Upcoming Events

UMC and Mentor Robust AMS/RF Reference Flow Event

Dates/Locations:
> January 23, 2008 - San Jose, CA
> January 30, 2008 - San Diego, CA