Foundry Design Kit (FDK)
The FDK (Foundry Design Kit) provides IC designers with an automatic design environment that eliminates unnecessary manual tasks and ensures successful tape-out.
The MM/RF complete design flow for UMC's various processes covers both the front and back-end of RFIC development. The methodology provides access to circuit-level design and simulation, circuit layout, and layout verification together with accurate RF device models. In the front-end, fundamental components of UMC's MM/RF process are implemented in common design environments and simulation tools. The back-end includes parameterized cells (PCell), which includes a schematic driven layout to provide an automatic and complete design flow. Callback functions are also provided in the design flow to minimize data entry. Through the procedure, designers can increase their productivity and reduce the risk for errors.
UMC has worked with its EDA tool partners to deliver
the industry's first parameterized spiral inductor design
kit based on full-wave simulation - the Virtual Inductor Library
(VIL). The VIL enables RFCMOS designers to create and simulate
custom inductor geometries that are compatible with UMC's
processes. It is built upon UMC's Electro Magnetic Design Methodology
(EMDM), which allows engineers to easily and accurately create
any RF structure. EMDM gives designers the flexibility to
innovate new geometries simply by editing parameters such
as diameter, number of turns, width and spacing of traces. Besides Virtual Inductor Library (VIL), UMC also delivers Virtual Capacitor Library (VCL) and Virtual Transformer Library (VTL).
UMC also offers the Optimum Inductor Finder (OIF)), Optimized Capacitor Finder (OCF) and Optimized Transformer Finder (OTF)
in the FDK package. For instance, the OIF gives designers the ability to
quickly access a large library of inductors accurately calibrated
to UMC's silicon. It also allows users to perform inductor
optimization through just a few simple steps using the user-friendly
software. Customers can define a desired inductance
and make tradeoffs between Q-factor and area. The OIF will
select from its inductor library a design that best fits the
specifications in a matter of seconds.
For further information regarding the FDK, please contact your Account Manager.