Photomasks and UMC Group Finalize Photomask Joint Venture in Taiwan
Photomasks Taiwan, Ltd. to Produce Advanced Photomasks in Key Semiconductor
ROUND ROCK, Texas--Oct. 7, 1998-- DuPont Photomasks, Inc. (Nasdaq:DPMI),
commonly referred to as DPI, and UMC Group, today announced the
finalization of a merchant photomask joint venture to produce photomasks
DuPont Photomasks Taiwan, Ltd., the joint venture is majority owned
by DPI and will operate initially from UMC Group's existing photomask
production facility in Taiwan's Hsin-Chu Science-based Industrial
Park. The venture employs 40 people and plans to invest (US) $50
million over the next year, including upgrading the infrastructure
and installing new photomask production equipment to support 0.25
micron design rules and below.
Photomasks Taiwan, Ltd. also plans to build a new, stand-alone photomask
production facility in Taiwan to accommodate high volume, commercial
production of sophisticated photomasks used for imaging of 0.18
micron and below integrated circuits.
remains one of the fastest growing semiconductor markets in the
world, driven by both foundry and DRAM production,'' said Mike Hardinger,
chairman and CEO of DuPont Photomasks. ``By entering into this joint
venture and locating our initial photomask production facility in
Hsin-Chu Science-based Industrial Park, DPI is better positioned
to service our fabless and foundry customers, in addition to the
integrated device manufacturers located in Taiwan.''
venture delivers world-class photomask technology to Taiwan and
will provide to local semiconductor producers, including UMC Group
companies, improved access to advanced binary, optical proximity
correction and phase shift masks necessary to help accelerate our
technology roadmap,'' said H.J. Wu, president of UMC.
creating this joint venture, UMC Group is better able to focus its
internal resources on developing state-of-the-art wafer processes
which will deliver superior value to our customers. We are pleased
to join forces with DPI and look forward to working together to
help make DuPont Photomasks Taiwan, Ltd. a success.''
new venture, expected to begin operations by the end of the calendar
year, will strengthen DPI's position in the Asia Pacific region
where it currently maintains facilities in Ichon, Korea and Shanghai,
China and announced in April of this year its intent to construct
a new facility in Singapore.
is the world's premier and largest photomask manufacturer with the
infrastructure in all three regions of the world to support the
production of advanced photomasks, including those employing optical
proximity correction (OPC) and phase shift features. OPC and phase
shift techniques are enabling technologies used to provide enhanced
depth of focus and critical dimension control necessary to fabricate
semiconductor devices with deep sub-micron feature sizes.
is the world's largest photomask manufacturer, operating globally
from ten strategically located facilities in North America, Europe
and Asia. The company produces and supplies photomasks as well as
photoblanks (photomask substrates) and pellicles (protective covers
for photomasks). Headquartered in Round Rock, Texas, DPI posted
worldwide sales of over $271 million in fiscal 1998. The company
maintains a Web site at www.photomask.com
This release includes forward-looking statements based on management's
current plans and expectations. Such statements involve risks and
uncertainties which may cause future activities and results of operations
to differ from those suggested, including risks associated with
industry trends, international currency fluctuations, capacity utilization
and the need to manage growth. For additional information, please
refer to DPI's filings with the Securities and Exchange Commission,
specifically the company's most recent Form 10-K dated September
18, 1998, which identifies important risk factors that could cause
actual results to differ from those contained in the forward looking
statements. Results for interim periods are not necessarily indicative
of results for the year.