14nm

  • Introduction
  • UMC’s 14nm FinFET process is integrated and mass-produced at Fab 12A in Tainan, Taiwan, delivering stable, industry-competitive yields since 2017. A wide range of design support resources is available to help customers streamline their design-in process.

     

    The process utilizes a 3D Fin module transistor structure, High-k/Metal Gate (HKMG) stack, low-k spacers, and strain engineering. These features provide superior processing speeds and higher gate density over 28nm and 22nm planar nodes. The platform also provides a complete design enablement ecosystem, including silicon-proven IP, foundry design kits (FDK), and standard command files fully validated for Cadence and Synopsys design tools.

     

    This node is well matched for high-speed computing, network routing hardware, and high-end consumer electronics that demand proven operational longevity.

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